AUTHORS: Chen YT, Lo TN, Chu YS, Yi J, Liu CJ, Wang JY, Chiu CW, Hua TE, Hwu Y, Shen Q, Yin GC, Liang KS, Lin HM, Je JH, Margaritondo G

Nanotechnology, 19(39): 395302, October 2008

ABSTRACT

The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.

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