AUTHORS: Lo TN, Chen YT, Chiu CW, Liu CJ, Wu SR, Lin IK, Su CI, Chang WD, Hwu Y, Shew BY

Journal of Physics D: Applied Physics, 40(10): 3172, May 2007

ABSTRACT

A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.

 

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