AUTHORS: Chen YT, Lo TN, Chiu CW, Wang JY, Wang CL, Liu CJ, Wu SR, Jeng ST, Yang CC, Shiue J, Chen CH, Hwu Y, Yin GC, Lin HM, Je JH, Margaritondo G

Journal of Synchrotron Radiation, 15(2): 170-5, March 2008

ABSTRACT

The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

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